Speaker
Description
High charge state electron cyclotron resonance ion
source (ECRIS) is characterized by a so-called min-B
magnetic field configuration, which provokes the
localized plasma over-heating to plasma chamber
especially for the 3rd generation ECRISs at high
power operation condition. With the increase of rf
power, more plasma energy will be dumped to tiny
areas and result in a very high localized power
density, which is estimated to be up to 1 kW/cm2.
Few existing ECR plasma chamber cooling designs
can withstand such high heat fluxes. In this paper,
we report a new plasma chamber cooling design with
so-called Micro-channel cooling technology, which can
not only realize efficient heat transfer, but also
retains a small radial thickness that is beneficial for
the radial magnetic field. In order to evaluate the
performance of the cooling structure with microchannel
design, experimental cooling loop for high
heat flux has been designed and built at IMP. Initial
experiments demonstrate that optimized
configuration can achieve high heat flux cooling in the
range of 1 kW/cm2 and beyond. Based on these
results, a plasma chamber with micro-channel design
for SECRAL has been designed and tested.